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model:PT-TRTP1000-S110LK1W

Rapid heating RTP annealing furnace

Application

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Detailed Parameters Of The Product

Specific Introduction:

The PT-TRTP1000-S110LK1W rapid heating RTP annealing furnace is a tube type furnace with a high vacuum degree for rapid heat treatment, equipped with a quartz cavity and vacuum flange. It is heated by a halogen lamp, with a heating rate of up to 50 ℃/second and PID automatic control. It is designed specifically for annealing semiconductor or solar cell substrates. It belongs to a type of RTP tube furnace.

Real photos of rapid heating RTP annealing furnace

Technical parameters:

name	Rapid heating RTP annealing furnace
Model	PT-TRTP1000-S110LK1W
Controller	LED (heating curve time setting is in seconds)
Furnace	Open type and slide type
Furnace tube size	OD110 outer diameter
heating zone	200mm
power supply	Furnace: Voltage: 380 V; Frequency: 50 Hz; Three phase; Vacuum pump: 220V 50Hz European standard plug
power	24 kw
heating element	halogen lamp
heating rate	0~50 C/S
Thermocouple	Design and match according to actual needs
temperature controller	30 segment high-precision digital programmable temperature controller
special requirements	Video inspection before shipment, payment upon receipt 1. The furnace is a sliding open type; 2. The heating element is a halogen lamp; 3. The quartz tube is open at one end and closed at the other end; 4. Two air inlets and one air outlet on the flange; 5. Equipped with digital vacuum gauge 6. There is a baffle valve on the flange connected to the vacuum pump of DRV10, and the vacuum degree of the furnace tube is pumped to a cold state of 10Pa; 7. Connect a quartz bracket with a flange as shown in the following figure; 8. There is a simple nitrogen float and oxygen float flow meter on the box, with a maximum flow rate of 500ml/min.