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model:PT-1000

rapid annealing furnace

Application

Detailed Parameters Of The Product

Product Overview:
This customized rapid annealing furnace is composed of RTP (rapid thermal processing) tube furnace, multi-channel proton flowmeter system and vacuum system. It is designed for semiconductor substrates and solar cells or other samples (up to 3" in size) Designed for annealing. This equipment is heated by infrared lamps, and the fastest heating rate is 50°C/sec. 30-stage precise temperature control, RS485 interface and control software can control the operation of the furnace through a computer and display the temperature curve.
Technical parameters:

product name	Customized rapid annealing furnace
Part 1: Tube furnace
product name	Open RTP tube furnace with upper and lower temperature zones
temperature	Up to 1000 degrees
Controller	LCD touch screen
Furnace tube size	Quartz tube outer diameter 80mm/inner diameter 72mm single side opening
Heating zone	300mm
Furnace type	Open
Power supply	Voltage: 380V; Frequency: 50 Hz; Three-phase
Heating element	Halogen heating
Heating rate	30 C/sec
Thermocouple	K-type thermocouple measures the temperature of the material
Temperature Controller	30-segment high-precision digital programmable temperature controller
Part Two Air Mixing System
Range	MFC1: Oxygen (O2) 0-200sccm MFC2: Argon (Ar) 0-200sccm
The third part of the vacuum system
Feiyue VDR-4 1L/S + dust filter supporting anti-corrosion digital vacuum gauge