model:PT-1200C-S-SL-CVD
Non-gaseous source chemical vapor deposition system
Application: Graphene growth, carbon nanotube development, silicon nitride film deposition, two-dimensional material growth, crystal material battery electrode field.
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info@lab-furnace.com
Detailed Parameters Of The Product
Main Feature:Z2JMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere FurnacConsists of electric sliding tube furnace, three channles gas supply system, vacuum and filtration system, precursor bubbling device, gas preheating device, software control and other parts. Suitable for precursors that are non-gaseous sources, such as solid or liquid precursors, the filling temperature of the precursor can reach 400 ° C, and the temperature can be adjusted independently. After the solid or liquid precursor is evaporated at a certain temperature, it is brought into the reaction area through inert gas Some CVD reactions.Z2JMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere FurnacZ2JMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere FurnacStructure:Z2JMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac1. The intake and exhaust of the left and right ends can be switched between each other; improve the uniformity of the coating on the substrate;Z2JMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
2. The bottom of the furnace body can be moved horizontally on the guide rail under the drive of the motor, and the moving speed can be set according to the process requirements. Z2JMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
3. Using touch screen and industrial control computer automatic control, parameter setting and operation are intuitive and convenient, and parameter automatic record keeping.Z2JMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
4. The gas supply system can be equipped with several mass flow meters according to the customer's experimental needs. The range of the flow meter is optional. The vacuum system can also be equipped with various vacuum pumps according to the customer's needs.Z2JMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere FurnacZ2JMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere FurnacTechnical Parameter
Z2JMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
Heating system
| max. temp. |
1200℃ |
| working temp. |
≤1100℃ |
| chamber size |
Φ40*800mm（diameter customzable） |
| insulation material |
High purity alumina fiber |
| thermocouple |
K type |
| Accuracy |
±1℃ |
| Temperature control |
30 programmable segments for precise control of heating rate ,cooling rate and dwell time |
| 10" touch screen built-in PLD |
| heating zone length |
150mm |
| constant zone length |
70mm |
| heating element |
Fe-Cr-Alloy adopted by Mo |
| voltage |
220V，50Hz |
| power |
2KW |
3 channels MFC
| Connector style |
Φ6mmDouble cutting ferrule stainless steel connector |
| Standard range（N2) |
100sccm，100sccm、200sccm；（OPTIONAL） |
| Accuracy |
±1.5% |
| Linearity |
±0.5～1.5% |
| Max.pressure |
3MPa |
| Working pressure range |
0.1～0.5 MPa |
Vacuum unit
| Inlet/Outlet caliber |
KF25 |
| pumping rate |
10m³/h |
| ultimate vacuum |
5X10-1Pa |
| Oil capacity |
1.1L |
| Rotation rate |
Z2JMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
1450rpm
|
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