model:
Magnetic pull rod type CVD equipment for preparing molybdenum sulfide
Application: Application: Graphene growth, carbon nanotube development, silicon nitride film deposition, two-dimensional material growth, crystal material battery electrode field.
Contact us for customize
send-email:
info@lab-furnace.com
Detailed Parameters Of The Product
Main Feature:FtfMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
The feature of this equipment is that the sulfur powder is placed in the cold zone at the left end, and when the vulcanization process starts, the sulfur powder is pushed into the thermal field by a pull rod type. The control circuit adopts fuzzy PID program control technology, which has high temperature control accuracy, small temperature impact range, reliable performance, and simple and easy operation. The same applies to CVD processes, such as silicon carbide coating, ceramic substrate conductivity testing, controlled growth of ZnO nanostructures, ceramic capacitor (MLCC) atmosphere sintering and other experiments.FtfMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
FtfMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
Technical Parameter:
tube size |
ODΦ25/50/60/80/100*1000mm(OPTIONAL) |
Max. temp |
1200℃ |
Working temp. |
≤1100 ℃ |
temp. control |
l PID automatic control and auto-tune function.FtfMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac l 30 programmable segments for precise thermal processing.FtfMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac l Built-in protection for the over-heated and broken thermocouple. |
heating rate |
≤50℃/min |
heating zone length |
200+200mm Customizable |
constant zone length |
100+100mm Customizable |
temp. acuuracy |
±1 ℃ |
Standard range |
50sccm、100sccm、200sccm、500sccm; optional |
pumping |
10m³/h |
vacuum |
5.0X10-1Pa |
FtfMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac