Zhengzhou Protech
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Kilogram grade organic semiconductor material purification equipment
model:PT-6-210

Kilogram grade organic semiconductor material purification equipment

    Application:  Sublimation of the organic mixture under high vacuum conditions to achieve the purpose of purification (i.e. recrystallization after evaporation)
Contact us for customize send-email: info@lab-furnace.com
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Detailed Parameters Of The Product
Technical parameterd9UMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
  1.Heating Element:resistance wire。d9UMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
  2.no. of heating zoens:5-8zones(customizable),realize A two-point control of a temperature zone to make the temperature field more uniform.d9UMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
  3.Sublimation zone temperature: room temperature to 800 ℃, continuously adjustable.d9UMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
  Insulation zone temperature: adjustable from room temperature to 400 ℃; constant temperature temperature fluctuation with time and space is not more than ± 1 ℃ (test method conforms to national measurement standard JJF 1184-2007).d9UMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
  4.Sublimation boat volume:0.5~10g,50~500g,500~2000g。d9UMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
  5.Temperature Controller:Adopted PID automatic and double  control by digital  industrial instrumentd9UMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
  6.Paperless record: built-in storage and record of running process data, external USB interface, you can connect a computer to copy data with one click.d9UMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
  7.Structure:①Can be electrically opened in half, automatically control the cooling and cooling system. Achieve controllable cooling speed.d9UMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
  ②Equipped with a 2-way high-precision mass flow meter system at the feed end to accurately control the gas flow, which can realize the expansion and adjustment of the production process.d9UMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
  ③The system adopts an automated process and sets a key operation of the process to reduce human factors. The process reliability can reach 99.9%.d9UMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
  8.Filter:Three lever filter protection device are various lever microporous metal mesh ,nitrogen condensation embedded ,90-degree angle terraced filteringd9UMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
  9.outer tube sizeΦ210X2000mm,The cavity adopts a three-layer quartz tube device, which can automatically feed and discharge materials. The structure can ensure that the vacuum chamber tube is not contaminated and maintains a high vacuum degree. The middle layer tube is easy to take and easy to clean. After the sublayer sublimation of the inner layer tube is easy to distinguish, it can ensure the maximum product and purity and yield (the maximum sublimation rate is 97%, which is related to the material and configuration).d9UMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
  10.The cavity adopts internal temperature control and external temperature control to switch between each other to prevent the uneven temperature field caused by quartz refraction and scattering.d9UMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
  11.The front end of the equipment adopts quartz sealed observation windows, which can observe the purification of materials in production in all directions without dead angles, and is equipped with a camera system to achieve full monitoring and recording of the production sublimation process.d9UMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
  12.The vacuum end is directly connected with a molecular pump with a main diameter of 200mm to ensure the high vacuum requirements in the experiment. A plug-in valve is added in the middle of the straight tube of 200mm in diameter. Too much pumping speed in the initial vacuum affects the direction of molecular diffusion, resulting in uneven material.d9UMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
  13.Fore mechanical pump 60m³/h,Molecular pumping speed160L/S。d9UMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
  Background vacuum: mechanical pump system: 1Pa molecular pump system 10-4Pa.d9UMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
 d9UMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
Various shaped inner tubes can be purchased
Kilogram grade organic semiconductor material purification equipment

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