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Plasma enhanced chemical vapor deposition (PECVD) system
model:KJ-T1200-PECVD system

Plasma enhanced chemical vapor deposition (PECVD) system

    Application:  Plasma Enhanced Chemical Vapor Deposition (PECVD) is widely used in semiconductor and thin-film industries. Key applications include: Dielectric Films, Solar Cells, Flexible Electronics, MEMS/NEMS.
Contact us for customize send-email: info@lab-furnace.com
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Detailed Parameters Of The Product
1. Structurevm8Muffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
Plasma enhanced chemical vapor deposition (PECVD) is a thin film growth technology that uses glow discharge (plasma) to react thin films containing gaseous substances. Our company designed this equipment according to experimental requirements, and the equipment is designed to meet the needs of various thin film research. The PECVD is equipped with spray towers and activated carbon boxes to meet the needs of exhaust gas treatment.vm8Muffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
 
Plasma enhanced chemical vapor deposition (PECVD) vm8Muffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
pecvd systemvm8Muffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
PECVD system with exhaust gas treatment device, exhaust gas treatment equipment:vm8Muffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
2 sets of spray towers, 2 sets of activated carbon boxes, 1 centrifugal purge machine.
vm8Muffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
vm8Muffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
 
2. Technical Parameters:
Model KJ-T1200-PECVD system
Tube Furnacevm8Muffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
Part
Display LED
Chamber Split type and upper part can be opened
Continuous Working Temp. ≤1100℃
Heating Rate Suggestion: 0~10℃/min (max. 20℃/min)
Temperature Zone 300mm Customizable
Heating Element Resistance Wire With Mo
Thermocouple N type
Temperature Control Accuracy ±1℃
Tube Size 100 x 1500mm (OD x L) Approx.
Material: High Purity Quartz
Temperature Control PID automatic control
Heating curves 30 steps programmable
Vacuum Flange Stainless Steel vacuum flange with valve
vm8Muffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
Supply vm8Muffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
Plasma RF Power
vm8Muffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
vm8Muffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
 
 
Output Power 5 -500W adjustable with ± 1% stability
RF frequency 13.56 MHz ±0.005% stability
Matching Automatic
RF Output Port 50 Ω, N-type, female
Noise <50 dB.
Cooling Air cooling.
Vacuum Pump
Diffusion Pump System Ultimate vacuum:10-5~10-6 Torr.vm8Muffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
And Inside tube vacuum: 10-3 Torr~10-4 Torr.vm8Muffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
Include Rotary pump, Diffusion pump, Vacuum gauge, Water cooler, Connecting pipe, Box, Valve.   
Mass Flow Metersvm8Muffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
(LCD Touch Screen)
Two precision mass flow meters :vm8Muffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
MFC Accuracy is: ±1.5% F.S.vm8Muffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
MFC 1 for Nitrogen : Gas flow range from 0~500sccmvm8Muffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
MFC 2 for Argon :  Gas flow range from 0~500sccmvm8Muffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
One gas mixing tank is installed on bottom case with 2 stainless steel needle valves is installed on left side of bottom case to control 2 type gases mixing manually.
Exhaust gas treatment equipment 2 sets Spray towervm8Muffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
2 sets Activated carbon boxvm8Muffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
1 set Centrifugal blow
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