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model:PT-ALD-1200X

Two Channels ALD Tube Furnace System

Application

Detailed Parameters of the Product

Introduction:
PT-ALD-1200X is a 4" tube furnace combining with two channel ALD valves and one channel liquid vapor delivery( Atomic Layer Deposition ) and as well as four channels gas delivery system for CVD growth of nanomaterial and pi film, The smart design makes ALD more cost effective and affordable for every research group.

Technical Parameter:

Control Pannel	· All parameters of ALD vapor puls time , and Gas flow are controlled by PLC via a 6" touch screen panel in a mobile cart · Control Two ALD valves with puls duation time and cycling with mico-second precision · Control For channels gas delivery with ±0.2%F.S via MFC · Display vacuum pressure · Other parameter upon request of customer · Please click picture below to see control interface
ALD valve	· Two ALD valves with pulse controller (min 10 ms duration ) · Capable of heating with thermal actuators
Liquid-Vapor Generator	· Automatic liquid vapor generator is included and connect to ALD valve
Dual Zone Split Tube furnace	· Max 1100ºC for continuous heating · Two programmable precision digital temperature controllers with 30 segments. · Two separate controlled Heating Zones · 200mm length for each heating zone · 400mm total in heating length · 250mm constant central temperature heating area if both zones were heated at the same temperature · 500ºC max temperature difference between two zones with thermal blocks in between · Optional: ALD control system can be installed with a short tube furnace or rotation tube furnace as picture below
Anti-corrosive Pressure Gauge	· 3.8x10^-5 to 1125 Torr measurement range · Anti-corrosive, gas-type independent · High accuracy and reproducibility at atmosphere for reliable atmospheric pressure detection · Fast atmospheric detection eliminates waiting time and shortens process cycle · Easy to exchange plug & play sensor element · Click the picture to view detail spec.
Vacuum Pump ( optional)	· 10E-2 Torr vacuum can be achieved inside processing tube · Vacuum pump is not included , suggest you order a dry pump for CVD process by click picture below
More Bubbler Optional	· Click picture below to order bubbler or evaporator for CVD, and below right for Constant temperature control module · Could add Quartz Crystal and thermocouple to monitoring thin film thickness and temperature at extra cost
Update Idea	· You may use ALD Device to build hybrid Plasma enhanced ALD+ CVD and ALD+PVD+CVD system to grow complex materials and Powder ALD with rotation furnace · ( PE-ALD+CVD) ( PE-ALD+PVD +CVD)
Warranty	One year limited warranty with lifetime support (Consumable parts such as processing tubes, O-rings, and heating elements are not covered by the warranty, please order replacements at related products below).
Compliance	· Built-in Pfeiffer's pump is ELT Certification · All electric components ( >24V) are UL / MET / CSA certified · The furnace is ready to pass TUV(UL61010) or CSA certification at extra cost.
Application Notes	· Tube furnaces with quartz tubes are designed for using under vacuum and low pressure < 0.2 bars / 3 psi / 0.02 Mpa · Attention: A two-stage pressure regulator must be installed on the gas cylinder to limit the pressure to below 3 PSI for safe operation. · The flow rate for gasses should be limited to < 200 SCCM (or 200 ml/min) for reducing thermal shocks to the tube · Vacuum limit definition for all quartz tube furnaces: * Vacuum pressures may only be safely used up to 1000°C
Application	· Using ALD to significant decrease the high solid–solid interfacial impedance between the garnet electrolyte and electrode materials.

Pre:Roll-to-roll film graphene growth equipment
Next:Plasma Enhanced Roll to Roll Chemical Vapor Deposition System for graphene production

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No. 104, building 31, Xingyang equipment manufacturing industrial park, Zhengzhou City,
Henan Province, China
Zhengzhou Protech Technology Co., Ltd
郑州诺泰科技有限公司

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