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The PT-TRTP1000-S110LK1W rapid heating RTP annealing furnace is a tube type furnace with a high vacuum degree for rapid heat treatment, equipped with a quartz cavity and vacuum flange. It is heated by a halogen lamp, with a heating rate of up to 50 ℃/second and PID automatic control. It is designed specifically for annealing semiconductor or solar cell substrates. It belongs to a type of RTP tube furnace.
Real photos of rapid heating RTP annealing furnace
| name | Rapid heating RTP annealing furnace |
| Model | PT-TRTP1000-S110LK1W |
| Controller | LED (heating curve time setting is in seconds) |
| Furnace | Open type and slide type |
| Furnace tube size | OD110 outer diameter |
| heating zone | 200mm Customizable |
| heating element | halogen lamp |
| heating rate | 0~50 C/S |
| Thermocouple | Design and match according to actual needs |
| temperature controller | 30 segment high-precision digital programmable temperature controller |
| special requirements | Video inspection before shipment, payment upon receipt 1. The furnace is a sliding open type; 2. The heating element is a halogen lamp; 3. The quartz tube is open at one end and closed at the other end; 4. Two air inlets and one air outlet on the flange; 5. Equipped with digital vacuum gauge 6. There is a baffle valve on the flange connected to the vacuum pump of DRV10, and the vacuum degree of the furnace tube is pumped to a cold state of 10Pa; 7. Connect a quartz bracket with a flange as shown in the following figure;  8. There is a simple nitrogen float and oxygen float flow meter on the box, with a maximum flow rate of 500ml/min. |
No. 104, building 31, Xingyang equipment manufacturing industrial park, Zhengzhou City,
Henan Province, China
Zhengzhou Protech Technology Co., Ltd
郑州诺泰科技有限公司
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