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model:PT-1200

RTP Tube Furnace

Application

Detailed Parameters Of The Product

Description：
It is designed for annealing semiconductor wafer or solar cell.Selling Point: Can be customized according to your needs.Based on the above information,you can You can choose according to the RTP tube furnace image and the table parameters in detail, and then contact us to get the price you expect.Selling Point: Can be customized according to your needs.Based on the above information,you can choose according to the RTP tube furnace image and the table parameters in detail

RTP tube furnace is heated by halogen light around the processing tube with a max. heating rate of max. 300°C/min. 30 segment precision temperature controller with +/-1ºC accuracy is built into the furnace to allow for heating, dwelling, and cooling at various steps.

Features of Rtp tube furnace :
(1). Great temperature uniformity.
(2) Over temperature protection and alarm.
(3) PID automatic control via SCR power control.
(4) Halogen heating element for fast heating.
(5) Sliding Chamber for fast cooling.

Technical parameters :

Limiting temperature	1200℃(max up to 1700)
Display	LED
Structure	Split and Rail Chamber
Temperature Zone	Single
Temperature Control Accuracy	±1°C
Constant hot zone length	50mm (±2°C) ; 80mm (±3°C)
Tube Material	Quartz Tube
Heating Element	IR Lamps
Sealing	Vacuum Flange
Temperature Control	PID automatic control via SCR power control
Heating curves	30 steps programmable
Chamber material	Alumina Fiber
Warranty	One year limited warranty (Consumable parts such as heating elements are not covered by the warranty)

We have a wide range of different optional function furnace to meet different heating requirement, also we accept customer design furnace R&D working, please email us your specific requirement, we will recommend most reasonable choice for you, thanks!

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