0-2000°C RESEARCH MATERIAL & HEATING TREATMENT'S LEADER
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Description:
cvd chemical vapor deposition is widely used for various CVD experimental reaction temperature at 1600 ℃, it can also be used for CNT and graphene synthesis, CVD grown graphene,battery materials preparation and other research field.
Outstanding features of cvd chemical vapor deposition furnace :
1. Open tube furnace
2. To be input inert gas, hydrocarbon gas,hydrogen.
3. Max. Temperature 1200C
We have a wide range of different optional function furnace to meet different heating requirement, also we accept customer design furnace R&D working, please email us your specific requirement, we will recommend most reasonable choice for you, thanks!
Technical Parameters:
| Model | PT-1200 CVD grown graphene furnace |
| Control system | Intelligent temperature control system |
| Display mode | Digital tube display(LED) |
| Limiting temperature | 1200℃ |
| Working temperature | ≤1150℃ |
| Heating rate | ≤20℃(suggestion:10℃/min) |
| Heating element | Aludirome |
| Heating zone | Single |
| Heating zone length | 400mm (Customizable) |
| Furnace tube material | Quartz tube |
| furnace tube diameter | 80mm (Customizable) |
| The furnace tube length | 1000mm (Customizable) |
| Gas tightness | Vacuum flange and corundum furnace tube up to4.03×10-3Pa |
| Control mode | PID Temperature control |
| Temperature accuracy | ±1℃ |
| Thermal Couple | N Type |
| The flow meter | Float flowmeter |
| Pneumatic pressure | -0.1~0.15 MPa |
| Warranty | 12 month (exclusive wearing part) |

CVD grown graphene furnace can be customized according to customers’requirements.