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Zhengzhou Protech
Zhengzhou Protech

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0-2000°C RESEARCH MATERIAL & HEATING TREATMENT'S LEADER

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Home > Products > Coating Equipment > PECVD System
1200 PECVD Systems
model:PT-T1200PECVD

1200 PECVD Systems

    Application:       This product is composed of RF power supply, gas proton flow control system, substrate temperature control system, and vacuum system. It is suitable for deposition of SiO2 and SiNx films from room temperature to 1200 °C, and can also realize TEOS source deposition and SiC film deposition. And liquid gas source deposition of other materials, especially suitable for the deposition of high-efficiency protective layer films on organic materials and non-damaged passivation films at specific temperatures.
Contact us for customize send-email: info@lab-furnace.com
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Detailed Parameters Of The Product
product description:
     This product is composed of RF power supply, gas proton flow control system, substrate temperature control system, and vacuum system. It is suitable for deposition of SiO2 and SiNx films from room temperature to 1200 °C, and can also realize TEOS source deposition and SiC film deposition. And liquid gas source deposition of other materials, especially suitable for the deposition of high-efficiency protective layer films on organic materials and non-damaged passivation films at specific temperatures.

1.1200℃ Tube Furnace Series:
Power KW 8
Outer shell Stainless steel
Inner lining Two layers of Alumina fiber
Heating element Resistance wire
Power supply V AC 208-240V, Single Phase, 50/60 Hz
Max. Temperature °C 1200 (2 hour)
Working  Temperature °C 1100 (Continuous)
Temperature Uniform °C ±1
Max Heating & Cooling rate °C/S ≤15 (Suggestion)
Tube Size mm Φ200×1400
Tube material High quality quartz
Heating zone size mm Φ250×300
Constant Temp. zone Length mm 180
Sealing Flanges
Temp. Control 30 programmable segments for precise control of heating rate, cooling rate and dwell time.
Built-in PID Auto-Tune function with overheating & broken thermocouple protection.
Over temperature protection and alarm allows for operation without attendant(s).
+/- 1 ºC temperature accuracy.
Accuracy °C ±1
Total weight Kg 100
2.600W Plasma RF Power supply 
Plasma RF Power
supply 
 
 		 Output Power 5 -600W adjustable with ± 1% stability
RF frequency 13.56 MHz ±0.005% stability
Reflection Power 200W max.
Matching Automatic
RF Output Port 50 Ω, N-type, female
Noise <50 dB.
Cooling Air cooling.
Power 220V, 50Hz
 
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