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Zhengzhou Protech
Zhengzhou Protech

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0-2000°C RESEARCH MATERIAL & HEATING TREATMENT'S LEADER

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Home > Products > Coating Equipment > PECVD System
PECVD system
model:PT-PECVD-1200-50*300-F3

PECVD system

    Application:   Wide temperature range; long sputtering area; adjustable tube; exquisite and compact, cost-effective, can achieve rapid temperature rise and fall, is an ideal choice for laboratory growth of thin film graphene, metal thin film, ceramic thin film, composite thin film, etc. Extended plasma clean etch use.
Contact us for customize send-email: info@lab-furnace.com
Zhengzhou Protech Zhengzhou Protech
Detailed Parameters Of The Product
product description:
     The PECVD system uses radio frequency to ionize the gas containing the atoms constituting the film to form a plasma locally, and the plasma is chemically active and easily reacts to deposit the desired film on the substrate.
 
Product Usage:
     Wide temperature range; long sputtering area; adjustable tube; exquisite and compact, cost-effective, can achieve rapid temperature rise and fall, is an ideal choice for laboratory growth of thin film graphene, metal thin film, ceramic thin film, composite thin film, etc. Extended plasma clean etch use.

Product Specs
Model PT-PECVD-1200-50*300-F3
Heating system Display LED
Limit Temperature 1200℃
Continuous Working Temp. ≤1100℃
Heating Rate Suggestion: 0~15℃/min (max. 20℃/min)
Temperature Zone 300mm
Heating Element Resistance with Mo
Thermocouple K type
Temperature Control Accuracy ±1℃
Tube Size 60 x 1200mm
Material: alumina
Temperature Control PID automatic control via SCR power control
Heating process 30 steps programmable
Power source 220V, 50 Hz, single phase at max. 3KW
Max working pressure 0.02MPa
Vacuum System
 		 Rotary vane pump
Include KF25 Adpater,  bellow for vacuum pump group and mobile cabinet with wheels.		  
 Ultimate vacuum 10Pa under cold state.
   
Vacuum gauge Inficon digital vacuum gauge
Vacuum Flange Stainless Steel vacuum flange with valves and needles
Mass Flow meters
 		 Flow scope CO2 (flow range: 0-200 sccm
CH4 (flow range: 0-200 sccm)
N2 the flow range (flow range: 0-200 sccm)
Accuracy ±1.5 % F.S.
Repeat accuracy ±1.5 % F.S.
Response time ≦10sec
Working pressure difference range 0.1~0.5MPa
Pressure resistance 3MPa
Temperature Coefficient Zero: ≤±0.2% F.S./℃; Span: ≤±0.2% F.S./℃
Working environment temperature 5~45℃
Input signal 0 V ~ +5.00 V
Output signal 0 V ~ +5.00 V
  Electric plug form DB15 pin（Female）
  Power +15 V 50 mA
-15V 200 mA
Plasma RF Generator Output Power: 0 -300W adjustable with ± 1% stability
RF frequency: 13.56 MHz ±0.005% stability
Reflection Power: 120W max.
Power stability index:  ± 0.1%
Matching: Automatic
Noise: <50 dB.
Whole efficiency:≧70%

 

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