Zhengzhou Protech
Zhengzhou Protech
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PECVD system
model:PT-PECVD-1200-50*300-F3

PECVD system

    Application:   Wide temperature range; long sputtering area; adjustable tube; exquisite and compact, cost-effective, can achieve rapid temperature rise and fall, is an ideal choice for laboratory growth of thin film graphene, metal thin film, ceramic thin film, composite thin film, etc. Extended plasma clean etch use.
Contact us for customize send-email: info@lab-furnace.com
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Detailed Parameters Of The Product
product description:tKCMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
     The PECVD system uses radio frequency to ionize the gas containing the atoms constituting the film to form a plasma locally, and the plasma is chemically active and easily reacts to deposit the desired film on the substrate.tKCMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
 tKCMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
Product Usage:
tKCMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
     Wide temperature range; long sputtering area; adjustable tube; exquisite and compact, cost-effective, can achieve rapid temperature rise and fall, is an ideal choice for laboratory growth of thin film graphene, metal thin film, ceramic thin film, composite thin film, etc. Extended plasma clean etch use.tKCMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
tKCMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
Product Specs
Model PT-PECVD-1200-50*300-F3
Heating system Display LED
Limit Temperature 1200℃
Continuous Working Temp. ≤1100℃
Heating Rate Suggestion: 0~15℃/min (max. 20℃/min)
Temperature Zone 300mm
Heating Element Resistance with Mo
Thermocouple K type
Temperature Control Accuracy ±1℃
Tube Size 60 x 1200mm
Material: alumina
Temperature Control PID automatic control via SCR power control
Heating process 30 steps programmable
Power source 220V, 50 Hz, single phase at max. 3KW
Max working pressure 0.02MPa
Vacuum SystemtKCMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
 
Rotary vane pumptKCMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
Include KF25 Adpater,  bellow for vacuum pump group and mobile cabinet with wheels.
 tKCMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
 Ultimate vacuum 10Pa under cold state.tKCMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
   
Vacuum gauge Inficon digital vacuum gauge
Vacuum Flange Stainless Steel vacuum flange with valves and needles
Mass Flow meterstKCMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
 
Flow scope CO2 (flow range: 0-200 sccmtKCMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
CH4 (flow range: 0-200 sccm)tKCMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
N2 the flow range (flow range: 0-200 sccm)
Accuracy ±1.5 % F.S.
Repeat accuracy ±1.5 % F.S.
Response time ≦10sec
Working pressure difference range 0.1~0.5MPa
Pressure resistance 3MPa
Temperature Coefficient Zero: ≤±0.2% F.S./℃; Span: ≤±0.2% F.S./℃
Working environment temperature 5~45℃
Input signal 0 V ~ +5.00 V
Output signal 0 V ~ +5.00 V
  Electric plug form DB15 pin(Female)
  Power +15 V 50 mAtKCMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
-15V 200 mA
Plasma RF Generator Output Power: 0 -300W adjustable with ± 1% stabilitytKCMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
RF frequency: 13.56 MHz ±0.005% stabilitytKCMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
Reflection Power: 120W max.tKCMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
Power stability index:  ± 0.1%tKCMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
Matching: AutomatictKCMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
Noise: <50 dB.tKCMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
Whole efficiency:≧70%
tKCMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
 

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