model:PT-O1200-4CPECVD
Large diameter pecvd system
Application: This system is widely used to deposit high-quality Sio2 film, Si3N3 film, diamond film, hard film, optical film and carbon nanotube (CNT), C/C composite material, SIC coating, graphite product SiC coating, etc.
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Detailed Parameters Of The Product
Brief Intrudction:
This equipment is mainly used for lab scale graphene growth and preparation, and it can be used for the growth of carbon nanotubes. High-quality transparent conductive film can be prepared for use in mobile phone touch screens, tablet computers, smart wearables, sensors and other fields.
Technical Specification:
Model |
PT-O1200-4CPECVD |
Display |
LED |
Max. Temperature |
1200℃ |
Continuous Woking Temp |
≤1100℃ |
Heating Rate |
0~20℃/min |
Temperature Zone |
Single |
Accuracy |
±1℃ |
Tube Size |
Ø60*1250mm(OD×L) |
Temperature Control |
PID automatic control via SCR power control |
Heating curves |
30 steps programmable |
Heating zone |
440mm |
constant heating zone |
150mm |
Power |
220V, 50 Hz, single phase at max. 4KW |
Output Power |
5 -500W adjustable with ± 1% stability |
RF frequency |
13.56 MHz ±0.005% stability |
Reflection Power |
200W max. |
Matching |
Automatic |
RF Output Port |
50 Ω, N-type, female |
Noise |
<50 dB. |
Cooling |
Air cooling. |
Power |
220V, 50Hz |
Anti-corrosive Pressure Gauge |
3.8x10-5 to 1125 Torr measurement range Anti-corrosive, gas-type independent |
Vacuum System |
Rotary vane pump+diffusion pump, max vacuum rate 6.67*10pa |
Mass Flow meters |
Four precision mass flow meters : MFC 1: Gas flow range from 0~100 sccm MFC 2&3: Control range from 0~200 sccm MFC 4: Control range from 0~500 sccm One gas mixing tank is installed on bottom case with liquid release valve 4 stainless steel needle valves is installed on left side of bottom case to control 4type gases mixing manually Gas inlet fitting: four 1/4NPS Gas outlet fitting: four 1/4NPS |