1. Customer Overview
Customer Name: National University of Singapore (NUS)XAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
XAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
Customer RequirementsTo realize the controlled chemical vapor deposition (CVD) growth of high-quality 2D materials (e.g., graphene, transition metal chalcogenides), carbon nanotubes and other low-dimensional functional materials under high-vacuum conditions. It aims to obtain large-area, uniform and structurally controllable thin films, providing a critical technical platform for innovative research on nanoelectronic devices, quantum materials and new energy materials.XAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
XAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
With the continuous advancement of research, multiple teams at NUS have raised higher requirements for CVD equipment performance. Conventional laboratory-scale CVD systems are limited in vacuum level, gas control accuracy and temperature uniformity, making them unable to meet the demands for controllable growth of high-quality two-dimensional materials. To expand experimental capabilities, the Department of Materials Science and Engineering at NUS conducted technical evaluations on multiple suppliers and finally selected our High Vacuum CVD System for process development of 2D materials, carbon nanotubes and other advanced materials via CVD growth.XAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere FurnacXAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere FurnacXAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac2. Equipment Introduction
Equipment Name: High Vacuum CVD System Model: PT-OTF-1200-80*300-F3XAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
XAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
Core Advantages
1. Ultra-High Vacuum Performance The ultimate vacuum reaches up to 6.67×10−3 Pa, leading the performance of laboratory-grade CVD systems. The high-vacuum environment effectively removes residual oxygen and moisture inside the quartz tube, creating an ultra-clean reaction atmosphere for high-quality CVD growth of 2D materials. It greatly reduces oxidation defects and unintended doping, and preserves the intrinsic properties of sensitive materials such as graphene and TMDs.XAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
XAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
2. Three-Channel Gas Delivery System The gas pipeline is specially optimized for N2, H2 and CH4, enabling precise gas mixing and flow regulation to fully meet the CVD growth requirements of graphene, carbon nanotubes and other carbon-based materials.Optional gases including Ar, O2 and C2H2 are available for customized processes. It features a flow accuracy of ±1.5% F.S. and a response time within 10 seconds, ensuring reliable composition regulation for complex multilayer films.XAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
XAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
3. High-Precision Temperature Control Equipped with PID automatic control and SCR power regulation, the system delivers a temperature accuracy of ±1℃. Up to 32-segment programmable heating and cooling curves accurately simulate sophisticated CVD growth procedures. Multi-step ramp, soaking and cooling settings fully satisfy the strict temperature profile requirements for epitaxial growth of low-dimensional materials. XAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
XAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
4. Wide Compatibility with Diverse Material Systems The standard configuration supports graphene growth with CH4/H2/Ar atmosphere, and is also applicable to the CVD synthesis of transition metal chalcogenides such as MoS2, WS2 and WSe2.It covers multiple research scenarios, including SiC coating deposition, conductivity testing of ceramic substrates, controllable growth of ZnO nanostructures, and atmosphere sintering of MLCC capacitors.XAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
XAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
5. Intuitive & User-Friendly OperationCentralized touchscreen control displays real-time data including temperature curves, gas flow rates and vacuum values. Experimental data can be automatically recorded and exported for process analysis and academic research.The mobile caster cabinet enables flexible laboratory layout adjustment and convenient daily maintenance.XAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere FurnacXAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac3. Equipment ApplicationsXAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere FurnacXAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac3.1 CVD growth of high-quality graphene3.2 CVD synthesis of transition metal chalcogenides (TMDs)3.3 Rapid preparation of ultra-thin amorphous carbon films3.4 Vapor deposition process development for perovskite solar cells
Comprehensive Value to Customer Research
1. High Vacuum Ensures Superior Material Quality An ultimate vacuum of 6.67×10−3 Pa minimizes oxidation defects and impurity doping during growth, maintaining high crystallinity and intrinsic performance of low-dimensional materials.XAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere FurnacXAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac2. Accurate Multi-Channel Gas RegulationThe three-channel mass flow meter system realizes precise blending of N2, H2, CH4 and other process gases. With high flow accuracy and fast response, it fully accommodates the CVD production of graphene, TMDs and other advanced functional materials.XAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere FurnacXAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac3. Precise & Flexible Thermal Programming±1℃ precise temperature control and 32-segment programmable profiles meet stringent heating demands for 2D material epitaxy, supporting accurate microstructure modulation for layered and composite films.XAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere FurnacXAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac4. Excellent Experimental RepeatabilityStable mechanical operation and standardized program control deliver high consistency among batch experiments, providing solid and credible data support for high-level journal publications and key research projects.XAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere FurnacXAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac5. Multi-Functional & High UtilizationBeyond graphene and TMD synthesis, the system is compatible with carbon nanotubes, perovskite films, ZnO nanostructures and MLCC sintering research, maximizing laboratory equipment utilization and expanding research boundaries.XAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere FurnacXAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere FurnacXAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac4. Customer Feedback
"Our research team possesses years of accumulated expertise in the CVD growth of two-dimensional materials—ranging from graphene to transition metal chalcogenides—processes that demand exceptionally high standards regarding CVD system vacuum levels, gas control, and temperature stability. The PT-OTF-1200-80*300-F3 high-vacuum CVD system achieves an ultimate vacuum level of 6.67×10⁻³ Pa—a performance metric far superior to that of comparable laboratory-grade equipment—thereby providing a pristine reaction environment essential for the growth of high-quality 2D materials. Its three-channel mass flow controllers feature high precision and rapid response times, enabling extremely accurate regulation of the CH₄/H₂/Ar gas ratios during graphene growth. The 32-segment programmable temperature control profile allows us the flexibility to design complex heating, holding, and cooling sequences with a temperature control accuracy of ±1°C, ensuring excellent experimental reproducibility. The system has been operating stably for over a year and remains one of the most heavily utilized pieces of equipment in our laboratory. Whether for growing monolayer graphene for spintronics research or for preparing TMDs for optoelectronic detection applications, this system provides reliable technical support. Furthermore, the thoughtful design featuring a mobile cabinet base equipped with casters makes the unit incredibly easy to relocate whenever our laboratory layout requires reconfiguration."XAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
XAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
—— Head, 2D Materials Research Team | Department of Materials Science and Engineering, National University of SingaporeXAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
"Our team focuses on the synthesis of high-quality two-dimensional (2D) materials via the CVD method, as well as their applications in electronic and quantum devices. Previously, the laboratory-grade CVD system we utilized achieved a vacuum level of only around 10⁻¹ Pa; consequently, residual oxygen significantly compromised the growth quality of MoS₂. This new high-vacuum CVD system has elevated the base vacuum level to the 10⁻³ Pa range, resulting in synthesized samples that exhibit markedly superior quality—characterized by narrower peak widths—in both Raman and photoluminescence spectra. The gas delivery lines are specifically engineered to accommodate a diverse array of CVD processes, enabling the flexible mixing of gases such as N₂, H₂, and CH₄ with exceptional precision in flow control. The system features an intuitive, touch-screen-based user interface, allowing our Ph.D. students to master independent operation within just half a day. Leveraging this system, we have successfully synthesized high-quality monolayer MoS₂ and WS₂, and have subsequently fabricated field-effect transistor devices based on these materials. Moving forward, we intend to utilize this system to explore additional novel 2D material systems. This system has truly become an indispensable core asset within our laboratory."XAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
XAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
—— Researcher, Low-Dimensional Materials and Devices Research Program, National University of SingaporeXAbMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac