model:PT-1200T
1200℃ double tube CVD system
Application: Suitable for CVD process, such as silicon carbide coating, ceramic substrate conductivity test, controlled growth of ZnO nanostructures, ceramic capacitor (MLCC) atmosphere sintering and other experiments.
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Detailed Parameters Of The Product
Product Overview:
This system is a special dual-tube CVD system, which is specially designed for growing thin films on metal foils, especially for the research on flexible metal foil electrodes of a new generation of energy. The sliding furnace can realize rapid heating and cooling of materials.
Technical Parameter:
product name
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1200℃ double tube CVD system
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The first part: 1200℃ double tube CVD system
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Product number
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PT-1200T
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Furnace tube size
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Double quartz tube
Outer tube: OD 100 x ID 96 x 1400 mm
Inner tube: OD 80 x ID 75 x 1800 mm
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Heating zone
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220+220mm
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Power supply
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230V, single phase, 50HZ
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power
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4.0 kw
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Heating element
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Resistance wire
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Heating rate
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0-20°C/min
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Thermocouple
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Type K
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Part 2: Water cooling system
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Flange
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1. Water chiller CW-3000
2. Water-cooled, sealed double-tube vacuum flange: Allow reaction gas to react between the two tubes (10mm gap), and the cooling gas is directly passed into the inner tube.
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Part Three Vacuum System
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Vacuum system
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1. Anticorrosive digital display vacuum gauge
2. VRD-16 rotary vane pump, pumping speed 4L/S, including flapper valve KF25 interface, bellows and box
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Part Four Air Mixing System
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Mass flowmeter
Range:
MFC 1: 0~10 sccm
MFC 2: 0~200 sccm
MFC 3: 0~10 slm
MFC 3: 0~10 slm
.......
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