Zhengzhou Protech
Zhengzhou Protech
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1200℃ double tube CVD system
model:PT-1200T

1200℃ double tube CVD system

    Application:  Suitable for CVD process, such as silicon carbide coating, ceramic substrate conductivity test, controlled growth of ZnO nanostructures, ceramic capacitor (MLCC) atmosphere sintering and other experiments.
Contact us for customize send-email: info@lab-furnace.com
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Detailed Parameters Of The Product

Product Overview:
   This system is a special dual-tube CVD system, which is specially designed for growing thin films on metal foils, especially for the research on flexible metal foil electrodes of a new generation of energy. The sliding furnace can realize rapid heating and cooling of materials.

Technical Parameter:

product name

1200℃ double tube CVD system

The first part: 1200℃ double tube CVD system

Product number

PT-1200T

Furnace tube size

Double quartz tube

Outer tube: OD 100 x ID 96 x 1400 mm

Inner tube: OD 80 x ID 75 x 1800 mm

Heating zone

220+220mm

Power supply

230V, single phase, 50HZ

power

4.0 kw

Heating element

Resistance wire

Heating rate

0-20°C/min

Thermocouple

 Type K

Part 2: Water cooling system

Flange

1. Water chiller CW-3000

2. Water-cooled, sealed double-tube vacuum flange: Allow reaction gas to react between the two tubes (10mm gap), and the cooling gas is directly passed into the inner tube.

Part Three Vacuum System

Vacuum system

1. Anticorrosive digital display vacuum gauge   

2. VRD-16 rotary vane pump, pumping speed 4L/S, including flapper valve KF25 interface, bellows and box

Part Four Air Mixing System

Mass flowmeter

Range:

MFC 1: 0~10 sccm  

MFC 2: 0~200 sccm  

MFC 3: 0~10 slm  

MFC 3: 0~10 slm  

.......


tube CVD system

Product

Zhengzhou Protech

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