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model:PT-T1200CVD

Large area CVD graphene growth equipment

Application

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Detailed Parameters Of The Product

Description：
Due to its unique structure and excellent properties, graphene has a very broad application prospect in the fields of physics, chemistry and materials. High quality and large area graphene can be prepared by CVD (chemical vapor deposition), which has been widely used.

Technical parameters :

Equipment size	Φ300*2800mm
Tube size	Φ300*3000mm
Max loading	20Kg
Heating element	KTL resistance wire
Hot zone	3-8 zones optional
Max temperature	Room temperature-1200C continuous adjustable
Temperature control	Man-machine interface plus PLC control, 10-inch LCD screen control, digital industrial control instrument dual control, industrial intelligent temperature control instrument and software to achieve dual control, PID control
Paperless record	Built-in storage and recording process data, external USB interface, you can connect the computer to copy data with one click
Structure description	① The equipment can be opened by electric, and cooling system can be automatically controlled. A controlled cooling rate can be achieved. ② Equipped with a 2-way high-precision mass flow meter system at the feed end to accurately control the gas flow, which can realize the expansion and adjustment of the production process. ③The system adopts automatic technological process and sets the process with one-key operation. Reduce human factors, process reliability can reach 99.9%; ④Mechanical pump system: 1pa, additionally equipped with a fine-tuning system to ensure that graphene can be grown under stable negative pressure; a graphene film with a daily output of 200,000 square centimeters can be realized
Chamber	Using internal temperature control and external temperature control to switch between each other to prevent the uneven temperature field caused by quartz refraction and scattering
Gas system	3-ways mass flow meter