Zhengzhou Protech
Zhengzhou Protech
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Large area CVD graphene growth equipment

Large area CVD graphene growth equipment

    Application:  Suitable for CVD process, such as silicon carbide coating, ceramic substrate conductivity test, controlled growth of ZnO nanostructures, ceramic capacitor (MLCC) atmosphere sintering and other experiments.
Contact us for customize send-email: info@lab-furnace.com
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Detailed Parameters Of The Product
Due to its unique structure and excellent properties, graphene has a very broad application prospect in the fields of physics, chemistry and materials. High quality and large area graphene can be prepared by CVD (chemical vapor deposition), which has been widely used.

Technical parameters :


Equipment size


Tube size


Max loading


Heating element

KTL resistance wire

Hot zone

3-8 zones optional

Max temperature

Room temperature-1200C continuous adjustable 

Temperature control

Man-machine interface plus PLC control, 10-inch LCD screen control, digital industrial control instrument dual control, industrial intelligent temperature control instrument and software to achieve dual control, PID control

Paperless record

Built-in storage and recording process data, external USB interface, you can connect the computer to copy data with one click

Structure description

① The equipment can be opened by electric, and cooling system can be automatically controlled. A controlled cooling rate can be achieved.

② Equipped with a 2-way high-precision mass flow meter system at the feed end to accurately control the gas flow, which can realize the expansion and adjustment of the production process.

③The system adopts automatic technological process and sets the process with one-key operation. Reduce human factors, process reliability can reach 99.9%;

④Mechanical pump system: 1pa, additionally equipped with a fine-tuning system to ensure that graphene can be grown under stable negative pressure; a graphene film with a daily output of 200,000 square centimeters can be realized


Using internal temperature control and external temperature control to switch between each other to prevent the uneven temperature field caused by quartz refraction and scattering

Gas system

3-ways mass flow meter

Large area CVD graphene growth equipment

Large area CVD graphene growth equipment


Zhengzhou Protech

After-sales serveces

After-sales serveces