model:PT-1200CVD
CVD furnace for CNT and graphene synthesis
Application: Suitable for CVD process, such as silicon carbide coating, ceramic substrate conductivity test, controlled growth of ZnO nanostructures, ceramic capacitor (MLCC) atmosphere sintering and other experiments.
Contact us for customize
send-email:
info@lab-furnace.com
Detailed Parameters Of The Product
Description:
1200C CVD furnace is widely used for various CVD experimental reaction temperature at 1100 ℃, it can also be used for CNT and graphene synthesis,vacuum protective atmosphere sintering nanomaterials preparation,battery materials preparation and other research field.
Features of CVD furnace :
1.Split Chamber for fast cooling and fast heating.
2.Touch screen interactive mode.
3.Uniform Temperature.
We have a wide range of different optional function furnace to meet different heating requirement, also we accept customer design furnace R&D working, please email us your specific requirement, we will recommend most reasonable choice for you, thanks!
Technical parameters of CVD furnace :
Model |
PT-1200CVD |
Chamber type |
Open type |
Display mode |
Digital tube display(LED) |
Limiting temperature |
1200℃ |
Working temperature |
≤1150℃ |
Heating rate |
≤20℃(suggestion:10℃/min) |
Heating element |
Aludirome |
Heating zone |
Single |
Heating zone length |
440mm |
Furnace tube material |
High purity quartz |
furnace tube diameter |
60mm |
The furnace tube length |
1000mm |
Gas tightness |
Vacuum flange and corundum furnace tube up to 4.03×10-3Pa |
Control mode |
PID Temperature control |
Temperature accuracy |
±1℃ |
Thermal Couple |
K Type |
Working voltage |
AC 110-480V 50Hz~60Hz |
Rated power |
2.5KW |
The flow meter |
Float flowmeter |
Pneumatic pressure |
-0.1~0.15 MPa |
Warranty |
12 month (exclusive wearing part) |
CVD furnace can be customized according to customers’requirements.