Zhengzhou Protech
Zhengzhou Protech
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CVD furnace for CNT and graphene synthesis

CVD furnace for CNT and graphene synthesis

    Application:  Suitable for CVD process, such as silicon carbide coating, ceramic substrate conductivity test, controlled growth of ZnO nanostructures, ceramic capacitor (MLCC) atmosphere sintering and other experiments.
Contact us for customize send-email: info@lab-furnace.com
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Detailed Parameters Of The Product

    1200C CVD furnace is widely used for various CVD experimental reaction temperature at 1100 ℃, it can also be used for CNT and graphene synthesis,vacuum protective atmosphere sintering nanomaterials preparation,battery materials preparation and other research field.

Features of CVD furnace :

1.Split Chamber for fast cooling and fast heating.
2.Touch screen interactive mode.
3.Uniform Temperature.

We have a wide range of different optional function furnace to meet different heating requirement, also we accept customer design furnace R&D working, please email us your specific requirement, we will recommend most reasonable choice for you, thanks!

Technical parameters of CVD furnace :
Model PT-1200CVD
Chamber type Open type
Display mode Digital tube display(LED)
Limiting temperature 1200℃
Working temperature ≤1150℃
Heating rate ≤20℃(suggestion:10℃/min)
Heating element Aludirome
Heating zone Single
Heating zone length 440mm
Furnace tube material High purity quartz
furnace tube diameter 60mm
The furnace tube length 1000mm
Gas tightness Vacuum flange and corundum furnace tube up to 4.03×10-3Pa
Control mode PID Temperature control
Temperature accuracy ±1℃
Thermal Couple  K Type
Working voltage AC 110-480V 50Hz~60Hz
Rated power 2.5KW
The flow meter Float flowmeter
Pneumatic pressure -0.1~0.15 MPa
Warranty 12 month (exclusive wearing part)

cvd furnace
CVD furnace can be customized according to customers’requirements.


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