model:PT-1200CVD
1200℃ CVD tube furnace
Application: Suitable for CVD process, such as silicon carbide coating, ceramic substrate conductivity test, controlled growth of ZnO nanostructures, ceramic capacitor (MLCC) atmosphere sintering and other experiments.
Contact us for customize
send-email:
info@lab-furnace.com
Detailed Parameters Of The Product
Description:
CVD tube furnace is widely used for various CVD experimental reaction temperature at 1200 ℃, it can also be used for vacuum sintering,vacuum protective atmosphere sintering nanomaterials preparation,battery materials preparation and other research field.
Outstanding features of CVD tube furnace :
1.Enclosed tube furnace
2.To be input inert gas, hydrocarbon gas,hydrogen.
3.Max. Temperature 1200℃
We have a wide range of different optional function furnace to meet different heating requirement, also we accept customer design furnace R&D working, please email us your specific requirement, we will recommend most reasonable choice for you, thanks!
Technical parameters of CVD tube furnace :
Model |
PT-1200CVD |
Control system |
Intelligent temperature control system |
Display mode |
Digital tube display(LED) |
Limiting temperature |
1200℃ |
Working temperature |
≤1150℃ |
Heating rate |
≤20℃(suggestion:10℃/min) |
Heating element |
Aludirome |
Heating zone |
Single |
Heating zone length |
400mm |
Furnace tube material |
Quartz tube |
furnace tube diameter |
80mm |
The furnace tube length |
1000mm |
Gas tightness |
Vacuum flange and corundum furnace tube up to4.03×10-3Pa |
Control mode |
PID Temperature control |
Temperature accuracy |
±1℃ |
Thermal Couple |
K Type |
Working voltage |
AC 110-480V 50Hz~60Hz |
Rated power |
3KW |
The flow meter |
Float flowmeter |
Pneumatic pressure |
-0.1~0.15 MPa |
Warranty |
12 month (exclusive wearing part) |
1200℃ CVD tube furnace can be customized according to customers’requirements.