Zhengzhou Protech
Zhengzhou Protech
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CVD chemical vapor deposition furnace with two gas channels
model:1200C CVD furnace

CVD chemical vapor deposition furnace with two gas channels

    Application:  It can also be used in research fields such as vacuum sintering, vacuum atmosphere protection sintering, nanomaterial preparation, battery material preparation and so on.
Contact us for customize send-email: info@lab-furnace.com
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Detailed Parameters Of The Product

cvd chemical vapor deposition is widely used for various CVD experimental reaction temperature at 1600 ℃, it can also be used for CNT and graphene synthesis, CVD grown graphene,battery materials preparation and other research field.

Outstanding features of cvd chemical vapor deposition furnace :
1.Open tube furnace 
2.To be input inert gas, hydrocarbon gas,hydrogen.
3.Max. Temperature 1200C

We have a wide range of different optional function furnace to meet different heating requirement, also we accept customer design furnace R&D working, please email us your specific requirement, we will recommend most reasonable choice for you, thanks!

Technical parameters of 
cvd chemical vapor deposition furnace :

Model PT-1200 CVD grown graphene furnace 
Control system Intelligent temperature control system
Display mode Digital tube display(LED)
Limiting  temperature 1200℃
Working temperature ≤1150℃
Heating rate ≤20℃(suggestion:10℃/min)
Heating element Aludirome
Heating zone Single
Heating zone length 400mm
Furnace tube material Quartz tube
furnace tube diameter 80mm
The furnace tube length 1000mm
Gas tightness Vacuum flange and corundum furnace tube up to4.03×10-3Pa
Control mode PID Temperature control
Temperature accuracy ±1℃
Thermal Couple K Type
Working voltage AC 110-480V 50Hz~60Hz
Rated power 3KW
The flow meter Float flowmeter
Pneumatic pressure -0.1~0.15 MPa
Warranty 12 month (exclusive wearing part)

CVD grown graphene furnace

CVD grown graphene furnace can be customized according to customers’requirements.


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