model:1200C CVD furnace
CVD chemical vapor deposition furnace with two gas channels
Application: It can also be used in research fields such as vacuum sintering, vacuum atmosphere protection sintering, nanomaterial preparation, battery material preparation and so on.
Contact us for customize
send-email:
info@lab-furnace.com
Detailed Parameters Of The Product
Description:
cvd chemical vapor deposition is widely used for various CVD experimental reaction temperature at 1600 ℃, it can also be used for CNT and graphene synthesis, CVD grown graphene,battery materials preparation and other research field.
Outstanding features of cvd chemical vapor deposition furnace :
1.Open tube furnace
2.To be input inert gas, hydrocarbon gas,hydrogen.
3.Max. Temperature 1200C
We have a wide range of different optional function furnace to meet different heating requirement, also we accept customer design furnace R&D working, please email us your specific requirement, we will recommend most reasonable choice for you, thanks!
Technical parameters of cvd chemical vapor deposition furnace :
Model |
PT-1200 CVD grown graphene furnace |
Control system |
Intelligent temperature control system |
Display mode |
Digital tube display(LED) |
Limiting temperature |
1200℃ |
Working temperature |
≤1150℃ |
Heating rate |
≤20℃(suggestion:10℃/min) |
Heating element |
Aludirome |
Heating zone |
Single |
Heating zone length |
400mm |
Furnace tube material |
Quartz tube |
furnace tube diameter |
80mm |
The furnace tube length |
1000mm |
Gas tightness |
Vacuum flange and corundum furnace tube up to4.03×10-3Pa |
Control mode |
PID Temperature control |
Temperature accuracy |
±1℃ |
Thermal Couple |
K Type |
Working voltage |
AC 110-480V 50Hz~60Hz |
Rated power |
3KW |
The flow meter |
Float flowmeter |
Pneumatic pressure |
-0.1~0.15 MPa |
Warranty |
12 month (exclusive wearing part) |

CVD grown graphene furnace can be customized according to customers’requirements.