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model:PT-PECVD

PECVD furnace for producing large area graphene films

Application

Detailed Parameters Of The Product

Description：
PECVD furnace for producing large area graphene films,is widely used product high quality sio2 film,si3N4 film,diamond film,hard thin film,optical thin film and CNT etc.

Descriptions of PECVD furnace:
PCVED by microwave or radio frequency make gas ionization containing film the
constituent atoms,in a local plasma formation,and plasma chemical activity is very strong,is easy to react,sedimentary out the desired film on substrate,it widely used product high quality sio2 film,si3N4 film,diamond film,hard thin film,optical thin film and CNT etc.

Outstanding features of PECVD furnace :
1. Lower temperature processing compared to conventional CVD.
2. Film stress can be controlled by high/low frequency mixing techniques.
3. Control over stoichiometry via process conditions.
4. Offers a wide range of material deposition, including SiOx, SiNx, SiOxNy andAmorphous silicon (a-Si:H) deposition.

PECVD furnace

Technical parameters of PECVD furnace :

Model		PT-1200-4-80(440) PECVD
Tube Furnace	Display	LED
	Max. Temperature	1200℃
	Continuous Woking Temp.	≤1100℃
	Heating Rate	0~10℃/min
	Temperature Zone	Single
	Accuracy	±1℃
	Tube Size	80440mm(ODheating zone)
	Temperature Control	PID automatic control via SCR power control
	Heating curves	30 steps programmable
	Power	220V,50 Hz Single phase,
Plasma RF Power supply	Output Power	5 -300W adjustable with ± 1% stability
	RF frequency	13.56 MHz ±0.005% stability
	Reflection Power	200W max.
	Matching	Automatic
	RF Output Port	50 Ω, N-type, female
	Noise	<50 dB.
	Cooling	Air cooling.
	Power	220V, 50Hz
Vacuum Pump	KFD25 adapter and stainless steel pipe are connected between pump tube flange with precision ball valve Digital vacuum pressure gauge and display are installed with the furnace
Mass Flow meters	Four precision mass flow meters : MFC 1: O2 flow range from 0~500 sccm MFC 2: H2 flow range from 0~500 sccm MFC 3: N2 flow range from 0~500 sccm MFC 4: Ar flow range from 0~500 sccm One gas mixing tank is installed on bottom case with liquid release valve 4 stainless steel needle valves is installed on left side of bottom case to control 4type gases mixing manually Gas inlet fitting: four 1/4NPS Gas outlet fitting: four 1/4NPS

PECVD furnace can be customized according to customers’requirements.
We have a wide range of different optional function furnace to meet different heating requirement, also we accept customer design furnace R&D working, please email us your specific requirement, we will recommend most reasonable choice for you, thanks!

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