Zhengzhou Protech
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PECVD furnace for producing large area graphene films

PECVD furnace for producing large area graphene films

    Application:  Suitable for the growth of graphene, carbon nanotubes and carbon nanowires
Contact us for customize send-email: info@lab-furnace.com
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Detailed Parameters Of The Product

PECVD furnace for producing large area graphene films,is widely used product high quality sio2 film,si3N4 film,diamond film,hard thin film,optical thin film and CNT etc.

Descriptions of PECVD furnace:
PCVED by microwave or radio frequency make gas ionization containing film the 
constituent atoms,in a local plasma formation,and plasma chemical activity is very strong,is easy to react,sedimentary out the desired film on substrate,it widely used product high quality sio2 film,si3N4 film,diamond film,hard thin film,optical thin film and CNT etc.

Outstanding features of PECVD furnace :
1. Lower temperature processing compared to conventional CVD. 
2. Film stress can be controlled by high/low frequency mixing techniques. 
3. Control over stoichiometry via process conditions.
4. Offers a wide range of material deposition, including SiOx, SiNx, SiOxNy andAmorphous silicon (a-Si:H) deposition.

PECVD furnace

Technical parameters of PECVD furnace :

Model PT-1200-4-80(440) PECVD
Tube Furnace Display LED
Max. Temperature 1200℃
Continuous Woking Temp. ≤1100℃
Heating Rate 0~10℃/min
Temperature Zone Single
Accuracy ±1℃
Tube Size 80*440mm(OD*heating zone)
Temperature Control PID automatic control via SCR power control
Heating curves 30 steps programmable
Power 220V,50 Hz Single phase,
Plasma RF Power
Output Power 5 -300W adjustable with ± 1% stability
RF frequency 13.56 MHz ±0.005% stability
Reflection Power 200W max.
Matching Automatic
RF Output Port 50 Ω, N-type, female
Noise <50 dB.
Cooling Air cooling.
Power 220V, 50Hz
Vacuum Pump KFD25 adapter and stainless steel pipe are connected between pump
tube flange with precision ball valve
Digital vacuum pressure gauge and display are installed with the furnace
Mass Flow meters Four precision mass flow meters :
MFC 1: O2 flow range from 0~500 sccm
MFC 2: H2 flow range from 0~500 sccm
MFC 3: N2 flow range from 0~500 sccm  
MFC 4: Ar flow range from 0~500 sccm
One gas mixing tank is installed on bottom case with liquid release valve
4 stainless steel needle valves is installed on left side of bottom case to
control 4type gases mixing manually
Gas inlet fitting: four 1/4NPS
Gas outlet fitting: four 1/4NPS

PECVD furnace can be customized according to customers’requirements.
We have a wide range of different optional function furnace to meet different heating requirement, also we accept customer design furnace R&D working, please email us your specific requirement, we will recommend most reasonable choice for you, thanks!


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