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PECVD system-plasma enhanced chemical vapor deposition system

    Let me briefly introduce you to the concept of the PECVD system. The PECVD system is to reduce the reaction temperature of the traditional chemical meteorological deposition (CVD). An RF radio frequency induction device is added to the front of the ordinary CVD device to ionize the reaction gas to form a plasma. The activity of the body promotes the reaction, so this system is called an enhanced chemical vapor deposition system (PECVD).
chemical vapour deposition
    The mixed gas tube PECVD produced by Nuotai is the latest model, which combines the advantages of most domestic manufacturers' tube PECVD systems. A gas preheating zone is added to the front end of the PECVD. Experiments show that this structure has fast deposition speed, good film quality, and It has fewer holes and is not easy to crack. And the control part adopts a self-developed control system, which makes the operation easier and more powerful.
    At present, the mainstream of domestic PECVD coating is the tubular PECVD coating method, that is, using a quartz tube like a diffusion furnace tube as the deposition chamber, using a resistance furnace as a heating body, and inserting a graphite boat that can hold multiple silicon wafers. Deposited in a quartz tube. The uniformity of the deposition is closely related to the design of the electrode and the chamber. In addition, the gas flow of the tubular PECVD starts from the end of the quartz tube, which will also cause uneven distribution of the process gas, which will also lead to uneven film formation on the surface of the solar cell. Evenly.


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