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Two-dimensional material growth CVD system
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Two-dimensional material growth CVD system

    Application:  Graphene growth, carbon nanotube development, silicon nitride film deposition, two-dimensional material growth, crystal material battery electrode field.
Contace us for customize send-email: info@lab-furnace.com
Zhengzhou Protech Zhengzhou Protech
Detailed Parameters Of The Product
Main features
  Equipped with a preheating furnace for evaporating solid state sources
  Uses a slide furnace to achieve rapid heating/cooling and shorten the experiment time.
  The flange end is sealed by a clamp, which makes the feeding and discharging more convenient.
  Gas supply system can be configured with several mass flow meters according to the customer's experimental requirements. The flow meter's range can also be selected in different configurations. The vacuum system can also be configured with various vacuum pumps according to customer requirements.
 
Technical Parameters

Preheating Furnace
Max. Temp 400℃
zone length 100mm
Heating furnace
Max. Temp 1200℃
Power  2KW (220V)
zone length Heating:440mm
Constant:200mm


Temperature Controller
 
lPID automatic control and auto-tune function.
l30 programmable segments for precise thermal processing.
lBuilt-in protection for the over-heated and broken thermocouple. 
Heating Elements ·Resistance wire, Fe-Cr-Al Alloy doped by Mo
Temperature Accuracy +/- 1℃
Processing tube Size:Φ50*1650mm
Gas supply system
Connector style Double cutting ferrule stainless steel connector
(N2)Standard range(N2) 50sccm、100sccm、200sccm、500sccm; 
Accuracy ·±1.5%FS
Response time Gas characteristics:1~4sec
Electrical characteristics:10sec 
Linearity ±0.5~1.5%
Working pressure difference range 0.1~0.5MPa
Max. pressure ·3MPa
Pressure vacuum gauge -0.1~0.15 MPa, 0.01 MPa/grid
Vacuum unit
Relative air humidity ≤85%
pumping 10m³/h
vacuum 10-1Pa
Oil capacity 1.1L
Rotation rate 1450rpm
Noise   50dB
 

Product

Zhengzhou Protech

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