Zhengzhou Protech
Zhengzhou Protech
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model:PT-RTP1000

annealing tube furnace

  • temperature:
    • 1200
    • 1400
    • 1700
  • chamber size:
Contace us for customize send-email: info@lab-furnace.com
Zhengzhou Protech Zhengzhou Protech
Detailed Parameters Of The Product
Description:
RTP (Rapid Thermal Processing) is a method of heating the entire silicon wafer to a humidity range of 400 ~ 1100 ℃ in a very short time. Compared with furnace annealing, it has less thermal budget and impurities in silicon wafer Less, less stain and short processing time.
tube furnace

Technical Parameters:

Furnace

Type

RTP Tube furnace

Display

LED

Max.temperature

1200

Heating rate

25/S

Temperature accuracy

±50

Tube Diameter(OD)

Ø100mm

Tube length

600mm

Heat zone length

220mm

Heating element

Halogen light

Tube Material

Quartz

Chamber materials

alumina fiber

Thermal couple

K type

Max.power

30KW

Working voltage

AC 380V 50HZ three phase

Temperature control

PID automatic control via SCR power control

Heating curves

30 steps programmable

Warranty

One year limited manufacturer's warranty (Consumable parts such as processing tubes, O-rings and heating elements are not covered by the warranty, please order replacements at related products below).


Product

Zhengzhou Protech

After-sales serveces

After-sales serveces