Detailed Parameters Of The Product
Application:
UNIPOL-1202machine is equipped with 12" super flat lapping plate and can be used as a high precision lapping machine for polishing crystal components, semiconductor wafers, and ceramic substrates up to 4" in diameter. It can be used as a standard grinding and polishing machine for preparing metallographic samples as well.
Technical parameters:
Super-Flat 12" (300 mm) Diameter Lapping Plate |
Flatness < 0.25 micron / inch |
Precision Rotating Shaft |
Running Off < 5 micron |
Heavy Duty Cast Aluminum Case with Bright Painting |
Color : Black or White |
Features |
-
One cast iron plate for lapping and one cast aluminum plate for polishing.
-
Two rocking work stations with wafer holders and condition rings, which can be controlled independently for polishing 2 pcs of 4" wafers at the same time.
|
Two Work Stations with 8° Rocking and adjustable speed |
9 rocking / minute |
Two Flat Sample Holders for Carrying < 4" Dia. Wafer |
105 Dia. x 35 T mm |
Two Condition Rings |
120 O.D. x 110 I.D. x 32 T mm |
Variable Speed of Master Plate with Digital Display |
0 ~ 150 rpm |
Adjustable Timer for Auto-Stop |
0 - 99 hours |
Power |
120V or 240 V selectable via switch |
Motor |
300 W high torque DC motor |
Dimensions |
700 L x 475 W x 300 H (mm) |
Weight |
154 lbs |
Dimensions of shipment |
43" x 31" x 33" |
Weight of shipment |
200 Lbs |
Compliance |
CE Certified |
Warranty |
-
One year limited with lifetime support
-
Rusting and damage due to improper storage condition or maintenance is not covered by warranty
|
No. |
Description |
Qty |
1 |
12" polymide foam pad |
1 pc |
2 |
12" poromeric pad |
1 pc |
3 |
Power cord |
1 pc |
4 |
Sample holder |
2 pcs |
5 |
Wax |
2 pcs |
6 |
Condition ring |
2 pcs |
7 |
Hex wrench & screwdriver |
1 set |
8 |
Fuse(10A) |
2 pcs |
9 |
12" iron plate |
1 pc |
10 |
12" Aluminum plate |
1 pc |
11 |
Input tube & output tube |
1 pair
|