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Zhengzhou Protech
Zhengzhou Protech

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Plasma enhanced chemical vapor deposition (PECVD) system
model:KJ-T1200-PECVD system

Plasma enhanced chemical vapor deposition (PECVD) system

    Application:  Plasma Enhanced Chemical Vapor Deposition (PECVD) is widely used in semiconductor and thin-film industries. Key applications include: Dielectric Films, Solar Cells, Flexible Electronics, MEMS/NEMS.
Contact us for customize send-email: info@lab-furnace.com
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Detailed Parameters Of The Product
1. StructurevchMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
Plasma enhanced chemical vapor deposition (PECVD) is a thin film growth technology that uses glow discharge (plasma) to react thin films containing gaseous substances. Our company designed this equipment according to experimental requirements, and the equipment is designed to meet the needs of various thin film research. The PECVD is equipped with spray towers and activated carbon boxes to meet the needs of exhaust gas treatment.vchMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
 
Plasma enhanced chemical vapor deposition (PECVD) vchMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
pecvd systemvchMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
PECVD system with exhaust gas treatment device, exhaust gas treatment equipment:vchMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
2 sets of spray towers, 2 sets of activated carbon boxes, 1 centrifugal purge machine.vchMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
vchMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
 
2. Technical Parameters:
Model KJ-T1200-PECVD system
Tube FurnacevchMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
Part
 Display LED
Chamber Split type and upper part can be opened
Continuous Working Temp. ≤1100℃
Heating Rate Suggestion: 0~10℃/min (max. 20℃/min)
Temperature Zone 300mm
Heating Element Resistance Wire With Mo
Thermocouple N type
Temperature Control Accuracy ±1℃
Tube Size 100 x 1500mm (OD x L) Approx.
Material: High Purity Quartz
Temperature Control PID automatic control
Heating curves 30 steps programmable
Vacuum Flange Stainless Steel vacuum flange with valve
vchMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
Supply vchMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
Plasma RF PowervchMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
vchMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
 
 		 Output Power 5 -500W adjustable with ± 1% stability
RF frequency 13.56 MHz ±0.005% stability
Reflection Power 200W max.
Matching Automatic
RF Output Port 50 Ω, N-type, female
Noise <50 dB.
Cooling Air cooling.
Power 220V, 50Hz
Vacuum Pump
 Diffusion Pump System Ultimate vacuum:10-5~10-6 Torr.vchMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
And Inside tube vacuum: 10-3 Torr~10-4 Torr.vchMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
Include Rotary pump, Diffusion pump, Vacuum gauge, Water cooler, Connecting pipe, Box, Valve.   
Mass Flow MetersvchMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
(LCD Touch Screen)		 Two precision mass flow meters :vchMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
MFC Accuracy is: ±1.5% F.S.vchMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
MFC 1 for Nitrogen : Gas flow range from 0~500sccmvchMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
MFC 2 for Argon :  Gas flow range from 0~500sccmvchMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
One gas mixing tank is installed on bottom case with 2 stainless steel needle valves is installed on left side of bottom case to control 2 type gases mixing manually.
Exhaust gas treatment equipment 2 sets Spray towervchMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
2 sets Activated carbon boxvchMuffle Furnace,Tube Furnace,Vacuum Furnace,Atmosphere Furnac
1 set Centrifugal blow
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