0-2000°C RESEARCH MATERIAL & HEATING TREATMENT'S LEADER
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Description:
cvd chemical vapor deposition is widely used for various CVD experimental reaction temperature at 1600 ℃, it can also be used for CNT and graphene synthesis, CVD grown graphene,battery materials preparation and other research field.
Outstanding features of cvd chemical vapor deposition furnace :
1.Open tube furnace
2.To be input inert gas, hydrocarbon gas,hydrogen.
3.Max. Temperature 1200C
We have a wide range of different optional function furnace to meet different heating requirement, also we accept customer design furnace R&D working, please email us your specific requirement, we will recommend most reasonable choice for you, thanks!
Technical parameters of cvd chemical vapor deposition furnace :
Model | PT-1200 CVD grown graphene furnace |
Control system | Intelligent temperature control system |
Display mode | Digital tube display(LED) |
Limiting temperature | 1200℃ |
Working temperature | ≤1150℃ |
Heating rate | ≤20℃(suggestion:10℃/min) |
Heating element | Aludirome |
Heating zone | Single |
Heating zone length | 400mm |
Furnace tube material | Quartz tube |
furnace tube diameter | 80mm |
The furnace tube length | 1000mm |
Gas tightness | Vacuum flange and corundum furnace tube up to4.03×10-3Pa |
Control mode | PID Temperature control |
Temperature accuracy | ±1℃ |
Thermal Couple | K Type |
Working voltage | AC 110-480V 50Hz~60Hz |
Rated power | 3KW |
The flow meter | Float flowmeter |
Pneumatic pressure | -0.1~0.15 MPa |
Warranty | 12 month (exclusive wearing part) |
CVD grown graphene furnace can be customized according to customers’requirements.
We provide 24/7 hours global online service, one-stop customized service, welcome to consult.