PT-T1200 PECVD Tube Furnace System
Application: This system is widely used to deposit high-quality Sio2 film, Si3N3 film, diamond film, hard film, optical film and carbon nanotube (CNT), C/C composite material, SIC coating, graphite product SiC coating, etc.
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Detailed Parameters Of The Product
PT-T1200 PECVD is a is PE-CVD (Plasma Enhanced Chemical Vapor Deposition) tube furnace system which consists of 500W RF power supply, splitable tube furnace with 200mm diameter quartz tube, vacuum pump and three channels mass flow meters gas flowing system. It can mix 1-3 types of gases for CVD or diffusion.