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Large diameter pecvd system
model:PT-O1200-4CPECVD

Large diameter pecvd system

    Application:  This system is widely used to deposit high-quality Sio2 film, Si3N3 film, diamond film, hard film, optical film and carbon nanotube (CNT), C/C composite material, SIC coating, graphite product SiC coating, etc.
Contace us for customize send-email: info@lab-furnace.com
Zhengzhou Protech Zhengzhou Protech
Detailed Parameters Of The Product
Brief Intrudction:
    This equipment is mainly used for lab scale graphene growth and preparation, and it can be used for the growth of carbon nanotubes. High-quality transparent conductive film can be prepared for use in mobile phone touch screens, tablet computers, smart wearables, sensors and other fields.
 
Technical Specification:

Model PT-O1200-4CPECVD
Display LED
Max. Temperature 1200℃
Continuous Woking Temp ≤1100℃
Heating Rate 0~20℃/min
Temperature Zone Single
Accuracy ±1℃
Tube Size Ø60*1250mm(OD×L)
Temperature Control PID automatic control via SCR power control
Heating curves 30 steps programmable
Heating zone 440mm
constant heating zone 150mm
Power 220V, 50 Hz, single phase at max. 4KW
Output Power 5 -500W adjustable with ± 1% stability
RF frequency 13.56 MHz ±0.005% stability
Reflection Power 200W max.
Matching Automatic
RF Output Port 50 Ω, N-type, female
Noise <50 dB.
Cooling Air cooling.
Power 220V, 50Hz
Anti-corrosive Pressure Gauge 3.8x10-5 to 1125 Torr measurement range
Anti-corrosive, gas-type independent
Vacuum  System Rotary vane pump+diffusion pump, max vacuum rate 6.67*10pa
Mass Flow meters Four precision mass flow meters :
MFC 1: Gas flow range from 0~100 sccm
MFC 2&3: Control range from 0~200 sccm  
MFC 4: Control range from 0~500 sccm
One gas mixing tank is installed on bottom case with liquid release valve
4 stainless steel needle valves is installed on left side of bottom case to control 4type gases mixing manually
Gas inlet fitting: four 1/4NPS
Gas outlet fitting: four 1/4NPS

Product

Zhengzhou Protech

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