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Constant feeding & discharging Plasma rotary CVD system
model:PT-1200C-RP-PECVD

Constant feeding & discharging Plasma rotary CVD system

    Application:  Application: Graphene growth, carbon nanotube development, silicon nitride film deposition, two-dimensional material growth, crystal material battery electrode field.
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Detailed Parameters Of The Product
 The device is a fully automated Plasma Enhanced CVD System (PECVD) with continuous temperature control and Plasma strength. Equipped with a vacuum system that can be used under low pressure conditions. The PECVD system enables the entire experimental chamber to be in the glow generation area. The light is uniform and equivalent, which solves the unstable operation of the traditional plasma. The tube of the device can rotate 360°, which helps the sintering of the powder to be more uniform, can be inclined at a large angle, and is convenient for feeding and discharging. The inclination angle is  Between 0-35°, all pipeline materials passing through  are made of non-metallic materials. For example, the inlet and outlet chambers are made of quartz, and the push rods are made of quartz and PTFE.

 

Technical Parameter

Heating system:

Power:4KW

Voltage:AC220V  50/60Hz

Max. Temp:1200c

Working temp.:1100c

Tube Size:Ø60*420*2+Ø100*360mm*

Furnace tube rotation rate:0~60r/min

Furnace body inclination angle:0~35°

Temp accuracy:±1℃

Temp control:PID automatic control with 30 steps programmable

Operation interface:10”LCD touch screen control

Heating zone length:200mm+200mm

Constant zone length:250mm

Plasma system:

The system generates plasma by means of glow discharge. In the glow discharge plasma, the electron density is high, and the reaction characteristics of the non-equilibrium plasma are effectively utilized by the reaction gas discharge, which fundamentally changes the energy supply mode of the reaction system.

Feeding system:

The speed is continuously adjustable. When the feeding is stopped and the furnace body is tilted to the maximum, the material will not leak . The feeding system is easy to disassemble, and the material can be manually fed after disassembly, and the equipment can operate normally.


Discharge system:

The discharging system can automatically discharge when the furnace body is inclined and discharged.

Gas control system:

The gas control system can control the mixing ratio of the two gases according to different flow rates, and can also be independently controlled. The mass flow meter is installed in a sealed movable cabinet, which is composed of super clean stainless steel tube and the precision double ferrule joint.


Low vacuum system:

Equipped with a vacuum mechanical pump that can be vacuumed to allow the unit to react in a vacuum environment.


Separation system:

the system allows the separation of gas and material during the protection of the inflator or when vacuuming.


Filtering system:

The system prevents material from entering the vacuum pump and ensures proper operation of the vacuum pump.


Furnace tube rotation system:

Allows the  tube to rotate 360° at a constant speed. The rotation speed is continuously adjustable from 0 to 60 r/min for a long time.

 

constant feeding & discharging Plasma rotary CVD system

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