cvd chemical vapor deposition is widely used for various CVD experimental reaction temperature at 1600 ℃, it can also be used for CNT and graphene synthesis, CVD grown graphene,battery materials preparation and other research field.
Outstanding features of cvd chemical vapor deposition furnace :
1.Open tube furnace
2.To be input inert gas, hydrocarbon gas,hydrogen.
3.Max. Temperature 1200C
We have a wide range of different optional function furnace to meet different heating requirement, also we accept customer design furnace R&D working, please email us your specific requirement, we will recommend most reasonable choice for you, thanks!
Technical parameters of cvd chemical vapor deposition furnace :
|Model||PT-1200 CVD grown graphene furnace|
|Control system||Intelligent temperature control system|
|Display mode||Digital tube display(LED)|
|Heating zone length||400mm|
|Furnace tube material||Quartz tube|
|furnace tube diameter||80mm|
|The furnace tube length||1000mm|
|Gas tightness||Vacuum flange and corundum furnace tube up to4.03×10-3Pa|
|Control mode||PID Temperature control|
|Thermal Couple||K Type|
|Working voltage||AC 110-480V 50Hz～60Hz|
|The flow meter||Float flowmeter|
|Pneumatic pressure||-0.1～0.15 MPa|
|Warranty||12 month (exclusive wearing part)|
CVD grown graphene furnace can be customized according to customers’requirements.